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A fundamental study of photoresist dissolution with real time spectroscopic ellipsometry and interferometry
A fundamental study of photoresist dissolution with real time spectroscopic ellipsometry and interferometry
2003
Sean D. Burns
Gerard M. Schmid
Brian C. Trinque
James Willson
Jennifer Wunderlich
Pavlos C. Tsiartas
J. Chris Taylor
Ryan L. Burns
C. Grant Willson
Keywords:
fundamental study
Photoresist
Materials science
Dissolution
Optoelectronics
Interferometry
Ellipsometry
Correction
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