Processing, properties and microstructure of melt-processed Bi-2212 thick films

Abstract Bi-2212 thich films were produced by tape casting and partial melting on Ag-substrates. Highly aligned, almost single-phase microstructures throughout the oxide thickness of 20 μm were achieved. Optimizing the processing parameters to increase the critical current density j c lead to current densities of 18'000 A/cm 2 at 77K/OT and 350'000 A/cm 2 at 4K/OT (1 μ V/cm criterion, magnetically measured). In this paper the influence of the processing parameters on microstructure and properties of the thick films is discussed.