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Preparation and characterization of purely-fluorinated ion-plating a-Si:F films
Preparation and characterization of purely-fluorinated ion-plating a-Si:F films
1985
K Noguchi
H. Hoshino
T. Saito
T. Kamejima
Keywords:
Thin film
Engineering
Electronic engineering
Ion plating
Doping
Fluorine
Inorganic chemistry
Silicon
Chemical engineering
Band gap
Infrared spectroscopy
Thermal stability
Electrical engineering
Correction
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