Molecular precursors for OMCVD preparation of TiN, VN, TiC and VC thin-film ceramic materials*
1994
Twenty-two organometallic molecular compounds have been prepared and tested for use as precursors for the OMCVD preparation of TiN, VN, TiC and VC thin-film ceramic materials. Methodologies and main results on thermal analyses and deposit characterization are described.
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