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Fabrication of ZnO-based metalinsulatorsemiconductor diodes by ion implantation
Fabrication of ZnO-based metalinsulatorsemiconductor diodes by ion implantation
2004
Ya. I. Alivov
David C. Look
B. M. Ataev
M. V. Chukichev
V. V. Mamedov
V. I. Zinenko
Yu.A. Agafonov
A.N. Pustovit
Keywords:
Analytical chemistry
Ion implantation
Chemistry
Zinc
Leakage (electronics)
Electronic engineering
Full width at half maximum
Diode
Threshold voltage
Electroluminescence
Correction
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