Evaluation of Front-Opening Unified Pod with Attached UV/Photocatalyst Cleaning Unit

We have developed a wafer box for 300 mm Si wafers with an attached cleaning system for organic contamination gas. The front-opening unified pod (FOUP) is modified to be attached to the UV/photocatalyst cleaning unit. It is found that the reliability degradation of metal oxide semiconductor (MOS) capacitors fabricated using wafers stored in the FOUP with the cleaning unit is suppressed compared with that of MOS capacitors fabricated using wafers stored in the FOUP without the cleaning unit.