The Technique of thin Zinc Oxide Films Synthesis by ALD Method

Article shows experimental results of thin ZnO films synthesis with required structure and thickness produced by different atomic layer deposition methods (normal temperature, thermal and photo-assisted deposition). The influence of the synthesis temperature and UV-irradiation on the characteristics of ZnO films was analyzed. Both amorphous and polycrystalline films were synthesized by changing the deposition parameters. Film optical properties were examined in UV, visible and IR range. The bandgap was determined using absorption spectra. Morphological parameters of the films were valued using the atomic force microscopy. Suppositions on film growth mechanisms were made, preliminary results of friction wear tests are quoted.