Coupled Effects of Electronic and Nuclear Energy Deposition on Damage Accumulation in Ion-Irradiated SiC

Abstract Coupling between electronic and nuclear energy dissipation in ion-irradiated, single crystal 4H-SiC has been investigated using Si, Ti, and Ni ions over a range of energies at 300 K, and irradiation damage accumulation is characterized using Rutherford backscattering spectroscopy in channeling geometry. The damage production rate from nuclear energy loss (Sn) is observed to decrease with increasing electronic energy loss (Se) of incident ions. A dynamic threshold (Se,th) in electronic energy loss is determined for each ion species, which defines two regions: i) Se > Se,th, where electronic energy dissipation fully suppresses damage production due to nuclear energy loss along incident ion paths, and ii) Se