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Performance and Reliability of Sub-micron PMOS Devices Formed by Implantation into Silicide
Performance and Reliability of Sub-micron PMOS Devices Formed by Implantation into Silicide
1989
Barlow
Stogdale
Keywords:
Optoelectronics
Reliability (semiconductor)
Boron
PMOS logic
Silicon
Materials science
Silicide
Correction
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