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Control of the preferential orientation and the crystal structure of HfO 2 :Y/Si films by change in oxygen partial pressure
Control of the preferential orientation and the crystal structure of HfO 2 :Y/Si films by change in oxygen partial pressure
2019
Yuki Saho
Daiki Kamada
Kenshi Takada
Daisuke Kiriya
Takeshi Yoshimura
Atsushi Ashida
Norifumi Fujimura
Keywords:
Crystallography
Partial pressure
Materials science
Crystal structure
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