What is the optimum exposure does for a positive resist containing poly-functional photoactive compound?

Abstract Latent image concentration gradients are examined for the purpose of selecting photoresist exposure dose to optimize lithographic process latitudes. This is treated for the general case where multi-functional photoactive compounds are present in the resist and there is a supralinear relationship between dissolution rate and dose. Results are compared with two resist systems for which the process photospeed has been varied, one with a low q eff and another with a q eff >5.