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Numerical Analysis of Incident Ion and Radical Fluxes onto Substrate in Dual-Frequency Low-Pressure Ar/CH 4 Plasma
Numerical Analysis of Incident Ion and Radical Fluxes onto Substrate in Dual-Frequency Low-Pressure Ar/CH 4 Plasma
2020
Yuta Kimura
Shin Ogawa
Masahiro Kojima
Akinori Oda
Takayuki Ohta
Hiroyuki Kousaka
Keywords:
Substrate (chemistry)
Numerical analysis
Plasma
dual frequency
Ion
Diamond-like carbon
Analytical chemistry
Flux (metallurgy)
Materials science
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