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The Characteristics of Hafnium-Aluminate Films Grown by ALD System Using TEMAH , TMA and O3
The Characteristics of Hafnium-Aluminate Films Grown by ALD System Using TEMAH , TMA and O3
2006
Dong Won Lee
Dongchan Suh
Ko Dae-Hong
Keywords:
Aluminate
Hafnium
Materials science
Inorganic chemistry
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