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Photoreflectance Study of the Chemically Modified (100) GaAs Surface | NIST
Photoreflectance Study of the Chemically Modified (100) GaAs Surface | NIST
1994
John A. Dagata
Orest J. Glembocki
J A. Tuchman
K K Ko
Stella W. Pang
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Analytical chemistry
Materials science
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