Electrical and optical response of phthalocyanine thin films to No2

Abstract Thin films of several metal phthalocyanine compounds (MPc; M=H 2 , Cu, Ni, Pb,) have been prepared by evaporation onto heated substrates and by plasma deposition on substrates at room temperature. Their electrical and infrared response to NO 2 /air mixtures have been determined at room temperature and at elevated temperatures. Films prepared by evaporation are very sensitive and fast responding at room temperature to low concentrations (25 ppb). While not as sensitive, the plasma deposited films are more mechanically durable. The basis for selectivity of gas detection via an array of sensors is shown. Morphology of the films has been determined by TEM.