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Dopant Activation of In Situ Phosphorus‐Doped Silicon Using Multi‐Pulse Nanosecond Laser Annealing
Dopant Activation of In Situ Phosphorus‐Doped Silicon Using Multi‐Pulse Nanosecond Laser Annealing
2020
Hyunsu Shin
Minhyung Lee
Eunjung Ko
Hwa-yoen Ryu
Seran Park
Eunha Kim
Dae-Hong Ko
Keywords:
Pulse (signal processing)
nanosecond laser
Optoelectronics
Annealing (metallurgy)
In situ
phosphorus doped
Physics
Condensed matter physics
Silicon
Dopant Activation
Correction
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