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Novel Lithography-Independent Pore Phase Change Memory
Novel Lithography-Independent Pore Phase Change Memory
2007
Matthew J. Breitwisch
Th. Nirschl
C. F. Chen
Yu Zhu
Ming Hsiu Lee
Mark C. H. Lamorey
Geoffrey W. Burr
Eric A. Joseph
Alejandro G. Schrott
Jan-Boris Philipp
Roger W. Cheek
Thomas Happ
Shih-Hung Chen
S. Zaidr
P.L. Flaitz
John Bruley
R. Dasaka
Bipin Rajendran
S. Rossnage
Min Yang
Yi-Chou Chen
Ralph Bergmann
Hsiang Lan Lung
Chung H. Lam
Keywords:
Lithography
Chip
Critical dimension
Phase-change memory
Optoelectronics
Materials science
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