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Characterization of TiSi2 Ohmic and Schottky Contacts Formed by Rapid Thermal Annealing Technology
Characterization of TiSi2 Ohmic and Schottky Contacts Formed by Rapid Thermal Annealing Technology
1989
C. Mallardeau
Y. Morand
E. Abonneau
Keywords:
Chemistry
Ohmic contact
Annealing (metallurgy)
Analytical chemistry
Schottky diode
Inorganic chemistry
Optoelectronics
rapid thermal annealing
Correction
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