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Exposure source optimization by clustering for lithography
Exposure source optimization by clustering for lithography
2014
Masashi Tawada
Masao Yanagisawa
Nozomu Togawa
Takaki Hashimoto
Keishi Sakanushi
Shigeki Nojima
Toshiya Kotani
Keywords:
Cluster analysis
Computer vision
Lithography
Artificial intelligence
Materials science
Pattern recognition
Computer science
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