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Electrical Properties of Al2O3 Incorporated CeO2 Thin Films Deposited by RF Magnetron Sputtering
Electrical Properties of Al2O3 Incorporated CeO2 Thin Films Deposited by RF Magnetron Sputtering
2016
Junya Konishi
Takashi Ohsawa
Setsu Suzuki
Keiji Ishibashi
Sung-Gi Ri
Kenichiro Takahashi
Yasuhiro Yamamoto
Keywords:
High-power impulse magnetron sputtering
Thin film
Sputter deposition
Analytical chemistry
Materials science
Optoelectronics
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