Spin lattice relaxation of 8Li in a ferromagnetic EuO epitaxial thin film

Abstract We inject a low energy spin polarized Li + 8 beam into an epitaxially grown multilayer film consisting of Au(20 nm)/EuO(100 nm)/ LaAlO 3 , and investigate the nuclear spin relaxation at 3.33 T. The relaxation varies with implantation energy below 28 keV as the fraction of the probe Li 8 stopping in each layer changes. We attribute the fast relaxating component to the EuO, while the much slower relaxation has contributions from both the Au and the substrate. However, fast relaxation is still observed at the lowest implantation energy where all the Li 8 stops in the Au capping layer. This may be due to a proximity effect from the EuO.