Guanidiniumhexafluorometallate von Titan, Silicium, Germanium und Zinn. Guanidiniumpentafluorooxoniobat und Guanidiniumtetrafluorodioxowolframat

Die Titelverbindungen wurden aus den wassrigen Losungen der jeweiligen Fluorometallat-bzw. oxofluorometallatsauren nach Zugabe von Guanidiniumfluoridlosung als kristalline Verbindungen erhalten und ihre Gitterkonstanten bestimmt. Vom [C(NH2)3]2 Tif6 wurde die Kristallstruktur bestimmt: R.Gr. Cm, a = 12,869 A, b = 7,378 A, c = 6,243 A, β = 114,45°, Schichtstruktur, R = 0,0257. Kristallographische Daten von [C(NH2)3]2 SiF6:a = 12,612 A, b = 7,272 A, c = 6,171 A, β = 114,30°, von [C(NH2)3]2 GeF6:a = 12,773 A, b = 7,343 A, c = 6,202 A, β = 114,38°, von [C(NH2)3]2 SnF6:a = 12,972 A, b = 7,439 A, c = 6,356 A, β = 114,14°, von [C(NH2)3]2 NbOF5:a = 12,987 A, b = 7,425 A, c = 6,326 A, β = 114,25°, von [C(NH2)3]2 WO2F4:a = 12,941 A, b = 7,396 A, c = 6,256 A, β = 114,33°. Guanidinium Hexafluorometallates of Titanium, Silicon, Germanium, and Tin. Guanidinium Pentafluorooxoniobate and Guanidinium Tetrafluorodioxowolframate The title compounds were crystallized from the aqueous solutions of their fluorometallate respectively oxofluorometallate acids by adding of guanidinium fluoride solution. Their unit cells were determined and for [C(NH2)3]2 TiF6 its crystal structure was determined: s. g. Cm, a = 12.869 A, b = 7.378 A, c = 6.243 A, β = 114.45°, layer structure, R = 0.0257. The unit cell parameters of [C(NH2)3]2 SiF6: a = 12.612 A, b = 7.272 A, c = 6.171 A, β = 114.30°, of [C(NH2)3]2 GeF6: a = 12.773 A, b = 7.343 A, c = 6.202 A, β = 114.38°, of [C(NH2)3]2 SnF6 : a = 12.972 A, b = 7.439 A, c = 6.356 A, β = 114.14°, of [C(NH2)3]2 NbOF5:a = 12.987 A, b = 7.425 A, c = 6.326 A, β = 114,25°, of [C(NH2)3]2 WO2F4:a = 12.941 A, b = 7.396 A, c = 6.256 A, β = 114.33°.