An MeV facility for materials research

Abstract A facility consisting of two Van de Graaff-type MV accelerators for materials processing and characterization has been developed in collaboration with High Voltage Engineering Europa B.V. A newly developed heavy-ion implanter is used for generation of several-hundred-μA mass-analysed ion beams in the energy range from 10 keV up to 2. MeV. Beams of a wide range of elements can be extracted from three different types of ion sources, which can be exchanged in minutes using a high-pressure load-lock system. Other important new features include: integrated gas system, specially developed ion optics and injection system, mass analysis at high voltage level and an X-ray intensity level 2 samples in a class 100 clean room environment. In addition, the facility comprises a 2 MV system dedicated to sample analysis using RBS, channeling, NRA and PIXE. By the use of a magnet configuration in the acceleration tube also for this 2 MV accelerator an X-ray intensity level