Old Web
English
Sign In
Acemap
>
Paper
>
Design of Reactive Ion Etching Process Based on ab-initio Calculation
Design of Reactive Ion Etching Process Based on ab-initio Calculation
2008
Shigeno Matsumoto
Wilson Agerico Diño
Melanie David
Rifki Muhida
Tanglaw Roman
Shinichi Kunikata
Fumiyoshi Takano
Hiro Akinaga
Hideaki Kasai
Keywords:
Analytical chemistry
Transition metal
Ab initio
Reactive-ion etching
Process design
Chemistry
Correction
Cite
Save
Machine Reading By IdeaReader
13
References
0
Citations
NaN
KQI
[]