The radiation-sensitive resin composition and the polymer

The present invention aims to at hole pattern formation, provides CDU (CD Uniformity), MEEF (Mask Error Enhanced Factor) radiation-sensitive resin composition satisfying various characteristics required reduction of and polymer used therefor to. Providing a repeating unit of a specific structure having an adamantane structure, a polymer comprising a repeating unit of the specific structure having a cycloalkane structure, a radiation-sensitive resin composition containing the polymer.