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Atomic Layer Deposition of Nickel Nitride Thin Films using NiCl 2 (TMPDA) and Tert‐Butylhydrazine as Precursors
Atomic Layer Deposition of Nickel Nitride Thin Films using NiCl 2 (TMPDA) and Tert‐Butylhydrazine as Precursors
2019
Katja Väyrynen
Timo Hatanpää
Miika Mattinen
Mikko Heikkilä
Kenichiro Mizohata
J. Räisänen
Joosep Link
Raivo Stern
Mikko Ritala
Markku Leskelä
Keywords:
Physical chemistry
Physics
Thin film
Condensed matter physics
Atomic layer deposition
Nickel
Tert-butylhydrazine
Nitride
Correction
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