Large-scale implantation and deposition research at Los Alamos National Laboratory

This paper provides a review of research performed at two novel, large-scale ion implantation and deposition facilities developed within the High Energy-Density Physics Group at Los Alamos National Laboratory: the Plasma Source Ion Implantation (PSII) facility, where large-area (several m2) workpieces are being implanted with nitrogen and carbon for tribological applications using a 100 kV, 60 A pulse modulator, and the High Intensity Pulsed Ion Beam (HIPIB) facility, where high-temperature superconductor and diamond-like carbon films are being deposited from substrate material evaporated with a 300 keV, 30 kA ion beam capable of energy fluences of 30 kJ/cm2 per pulse over an area of 25 cm2.