Old Web
English
Sign In
Acemap
>
Paper
>
Simulation of unsteady thermal-flow field for modified chemical vapor deposition (MCVD) process
Simulation of unsteady thermal-flow field for modified chemical vapor deposition (MCVD) process
2022
Yingjuan Zhang
Nian Liu
Xiaojia Li
Fengwei Chen
Bo Yang
Cong Gao
Dawei Pan
Bo Li
Keywords:
Chemical vapor deposition
Chemical engineering
Thermal
flow field
process
Materials science
Correction
Source
Cite
Save
Machine Reading By IdeaReader
29
References
0
Citations
NaN
KQI
[]