Structure and optical properties of the WO3 thin films deposited by the GLAD magnetron sputtering technique

Abstract The deposition process and investigation of the physical properties of tungsten trioxide (WO3) thin films are presented in this paper. The WO3 thin films were deposited by magnetron sputtering technology with glancing angle deposition technique (GLAD) in a reactive mode. The substrate tilt angle various from 45° to 90° and 0°, and the sample rotation at a speed of 20 rpm was stabilized by the GLAD manipulator. After deposition, the samples were annealed at 400 °C/4h in air. Thin WO3 films were deposited on glass, quartz and silicon substrate. The crystal structure, morphology, and optical properties were determined by several x-ray measurements, optical spectroscopy, and spectroscopic ellipsometry. The structural and optical properties of the deposited films are presented and discussed.