Liquid injection metal organic chemical vapour deposition of nickel zinc ferrite thin films

Abstract Liquid injection metal organic chemical vapour deposition has been used to grow thin films of the single metal oxides of nickel, zinc and iron, the binary ferrites of nickel ferrite and zinc ferrite and the ternary nickel zinc ferrite. The precursor chemicals used for the deposition of the metal oxide layers were solutions of the metal thd compounds (thd=2,2,6,6-tetramethyl-3,5-heptanedionato) dissolved in tetrahydrofuran. The growth rates of the single metal oxide layers have been systematically determined as a function of substrate temperature in the temperature range 300–650°C and the ferrite layers were deposited at a substrate temperature of 500°C. The ferrite layers were polycrystalline with well-defined spinel crystal structures.