Method for reducing surface reflectivity of texture mono-crystalline silicon chip

The invention discloses a method for reducing the surface reflectivity of a texture mono-crystalline silicon chip, relating to the technical range and field of preparation of solar cells. A mono-crystalline silicon chip with a texture made by alkaline corrosion is put into a plasma etching device to implement non-mask plasma etching so as to further reduce the surface reflectivity of the texture mono-crystalline silicon chip. Gas used for etching is a mixed gas of CF4 and O2 with the flow portion ranging from 10:1 to 1:3, and the pressure in the treatment chamber ranges from 1Pa to 20Pa. The invention further reduces the surface reflectivity of the texture mono-crystalline silicon chip, and provides a feasible way to further improve the conversion efficiency of the solar cell. The method is characterized by simpleness, convenience, effectiveness, low cost, easy operation, no need of additional equipment and suitability for large-scale production.