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EUV Resist Process Performance Investigations on the NXE3100 Full Field Scanner
EUV Resist Process Performance Investigations on the NXE3100 Full Field Scanner
2012
Anne Marie Goethals
Philippe Foubert
Kohei Hosokawa
Frieda Van Roey
Ardavan Niroomand
Dieter Van den Heuvel
Ivan Pollentier
Keywords:
Scanner
Resist
Extreme ultraviolet lithography
Materials science
Optics
full field
Correction
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