Remover composition for photoresist and method for removing photoresist

The invention relates to a remover composition for a photoresist, in particular to compound containing a benzimidazole-based component and a triazole-based component. The remover composition for a photoresist of the invention has an excellent capability of removing the photoresist and has a good anti-corrosion effect on a lower film of the photoresist when the lower film of the photoresist contains Mo.