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50‐3: Formation of Source and Drain Regions in Top‐Gate Self‐Aligned Oxide Semiconductor Field‐Effect Transistor
50‐3: Formation of Source and Drain Regions in Top‐Gate Self‐Aligned Oxide Semiconductor Field‐Effect Transistor
2018
Kenichi Okazaki
Toshimitsu Obonai
Yukinori Shima
Seiji Yasumoto
Junichi Koezuka
Noritaka Ishihara
Yoichi Kurosawa
Shunpei Yamazaki
Keywords:
Oxide
Field-effect transistor
Electronic engineering
Semiconductor
Materials science
oxide semiconductor
Optoelectronics
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