2-NITRO-p-XYLENE GLYCOL AS A FUNCTIONAL MONOMER FOR PHOTORELEASABLE ADHESION

1 Discussed herein is a system by which the adhesive can be photolytically degraded, and the adhesive properties diminish. This will allow for the simple removal of the device from the support substrate without heating. The backbone polymer matrix for an adhesive as described above must be thermally and photolytically stable, soluble, and demonstrate adequate adhesive performance. For this purpose, poly(esters) 2-5 and poly(sulfonates) 6- 10 are proposed. The photo-cleavable unit must swiftly and simply cleave in the presence of UV light. Compounds containing o-nitro benzyl esters have been shown to be deep photo-resists, and have been utilized for other photocleavable applications. 11-14 We have chosen 2-nitro-p-xylene glycol 15 as a functional monomer for the synthesis of photo-releasable adhesives.