Decomposition Property of Methylhydrazine with Titanium Nitridation at Low Temperature

We studied the thermal decomposition properties of methylhydrazine (MH) which is used in the chemical vapor deposition (CVD) of titanium-nitride (TiN-CVD). The decomposition was carried out on the surfaces of silicon dioxide (SiO 2 ) and titanium (Ti) at low pressures. The by-products were detected by the gas chromatography mass-spectrometry (GCMS), and surfaces were analyzed by electron spectroscopy for chemical analysis and Auger electron spectroscopy. MH decomposed on SiO 2 surface above 400 o C, producing methane (CH 4 ), ammonia (CH 4 ), and monomethylamine (MMA). Above 650 o C, CH 4 and NH 3 were predominantly generated instead of MH. The decomposition temperature on the Ti substrate was 200 o C and was even lower than the temperature on SiO 2 .