Method of detecting micro particles of chemical vapor deposited thin film

The invention discloses a method of detecting micro particles of a chemical vapor deposited thin film. The method at least comprises the following steps: 1, a wafer substrate is prepared; 2, metal is deposited on the wafer substrate; 3, a chemical vapor deposited thin film is deposited on the deposited metal; 4, an etching process is started; and 5, a surface scanning tool is used for scanning defects of the chemical vapor deposited thin film. Micro particles of the PECVD thin film can be detected, and a material wasting risk is reduced.