MEMS etch stop member

The present invention provides a microelectromechanical system (MEMS) device and a method for manufacturing such a device. In an embodiment, the MEMS device comprising: a substrate, a dielectric layer over the substrate, an etch stop layer over the dielectric layer, and two positioning and located above the plug dielectric layer, positioning of the two plugs are and etching a dielectric layer disposed over the metal stop layer or top layer in contact. The device further comprises a MEMS structure layer disposed above the cavity, the cavity sacrificial layer by releasing the positioning between the two plugs located in a position above the etch stop layer is formed. The present invention also provides a MEMS device an etch stop.