SiC-bulk growth by physical-vapor transport and its global modelling

Abstract 4H- and 6H-SiC bulk crystals have been prepared by physical vapor transport (PVT) both in resistively and inductively heated growth reactors. Epitaxial SiC layers were grown on the wafers by chemical vapor deposition. Structural and electrical material properties of the 1–1.4 inch boules and epitaxial layers were investigated by defect etching and optical microscopy, stress birefringence and Hall effect. Single crystalline material exhibits a low micropipe density MPD ≈ 70 cm −2 and stress level. Blocking characteristics of the epitaxial layers have been determined electrically revealing high breakdown fields of 1.8–1.9 MV/cm. Finally simulation results applying a process model of SiC PVT crystallization including heat and mass transfer and chemical reactions are presented.