Space-charge limited conduction in epitaxial chromia films grown on elemental and oxide-based metallic substrates

We study temperature dependent (200 – 400 K) dielectric current leakage in high-quality, epitaxial chromia films, synthesized on various conductive substrates (Pd, Pt and V2O3). We find that trap-assisted space-charge limited conduction is the dominant source of electrical leakage in the films, and that the density and distribution of charge traps within them is strongly dependent upon the choice of the underlying substrate. Pd-based chromia is found to exhibit leakage consistent with the presence of deep, discrete traps, a characteristic that is related to the known properties of twinning defects in the material. The Pt- and V2O3-based films, in contrast, show behavior typical of insulators with shallow, exponentially-distributed traps. The highest resistivity is obtained for chromia fabricated on V2O3 substrates, consistent with a lower total trap density in these films. Our studies suggest that chromia thin films formed on V2O3 substrates are a promising candidate for next-generation spintronics.We study temperature dependent (200 – 400 K) dielectric current leakage in high-quality, epitaxial chromia films, synthesized on various conductive substrates (Pd, Pt and V2O3). We find that trap-assisted space-charge limited conduction is the dominant source of electrical leakage in the films, and that the density and distribution of charge traps within them is strongly dependent upon the choice of the underlying substrate. Pd-based chromia is found to exhibit leakage consistent with the presence of deep, discrete traps, a characteristic that is related to the known properties of twinning defects in the material. The Pt- and V2O3-based films, in contrast, show behavior typical of insulators with shallow, exponentially-distributed traps. The highest resistivity is obtained for chromia fabricated on V2O3 substrates, consistent with a lower total trap density in these films. Our studies suggest that chromia thin films formed on V2O3 substrates are a promising candidate for next-generation spintronics.