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Deposition profile control of carbon films on trenched substrate by simultaneous plasma CVD and plasma etching
Deposition profile control of carbon films on trenched substrate by simultaneous plasma CVD and plasma etching
2011
Masaharu Shiratani
Tatsuya Urakawa
Daisuke Yamashita
Kunihiro Kamataki
Naho Itagaki
Giichiro Uchida
Kazunori Koga
Yuichi Setsuhara
Makoto Sekine
Masaru Hori
Keywords:
Plasma
Reactive-ion etching
Substrate (chemistry)
Plasma processing
Carbon film
Analytical chemistry
Plasma etching
Materials science
Chemical engineering
Deposition (law)
Correction
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