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感光性アジドポリマーの研究 V 新規なアルカリ可溶性フォトレジストの合成と感光特性
感光性アジドポリマーの研究 V 新規なアルカリ可溶性フォトレジストの合成と感光特性
1988
ken'iti ozeki
naoki okada
kyouko nakazawa
tuguo yamaoka
Keywords:
Plasma etching
Copolymer
Photoresist
Azide
Organic chemistry
Materials science
Lithography
Photochemistry
Chemical engineering
Correction
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