Gray-tone Blank Mask and Gray-tone Photomask, the Manufacturing method of them

A gray-tone blank mask, a gray-tone photomask, and a manufacturing method thereof are provided to finely manufacture a semi-transparent pattern for improving the quality of an FPD(Flat Panel Display), and to make the minimum linear width of an object identical to or less than 2mum. A gray-tone blank mask, which is a raw material of a gray-tone photomask used in a lithography exposure device using a single wavelength of 365nm or using exposure light of 365nm as a main exposure light source, comprises at least a non-transparent pattern, a semi-transparent pattern, and a transparent pattern on a transparent substrate(1). A semi-transparent layer(2) is deposited on the transparent substrate, and a non-transparent layer(3) is layered thereon.