Development of a High-Performance Gantry System for a New Generation of Optical Slope Measuring Profilers

abstract A new high-performance metrology gantry system has been developed within the scope of collabora-tive efforts of optics groups at the US Department of Energy synchrotron radiation facilities as well asthe BESSY-II synchrotron at the Helmholtz Zentrum Berlin (Germany) and the participation of industrialvendors of x-ray optics and metrology instrumentation directed to create a new generation of opticalslope measuring systems (OSMS) [1]. The slope measurement accuracy of the OSMS is expected to beo50 nrad, which is strongly required for the current and future metrology of x-ray optics for the nextgeneration of light sources.The fabricated system was installed and commissioned (December 2012) at the Advanced PhotonSource (APS) at Argonne National Laboratory to replace the aging APS Long Trace Profiler (APS LTP-II).Preliminary tests were conducted (in January and May 2012) using the optical system configuration ofthe Nanometer Optical Component Measuring Machine (NOM) developed at Helmholtz Zentrum Berlin(HZB)/BESSY-II. With a flat Si mirror that is 350 mm long and has 200 nrad rms nominal slope errorover a useful length of 300 mm, the system provides a repeatability of about 53 nrad. This valuecorresponds to the design performance of 50 nrad rms accuracy for inspection of ultra-precise flatoptics.& 2012 Elsevier B.V. All rights reserved.