Old Web
English
Sign In
Acemap
>
Paper
>
Plasma Assisted Chemical Vapour Deposition of Boron Nitride Using BCl3-N2-H2-Ar Gas Mixture.
Plasma Assisted Chemical Vapour Deposition of Boron Nitride Using BCl3-N2-H2-Ar Gas Mixture.
1997
Rossi Francois
Schaffnit Catherine
H. Del Puppo
Hugon Robert
Keywords:
Chemical vapor deposition
Plasma
Boron nitride
Organic chemistry
Inorganic chemistry
Materials science
Chemical engineering
BCL3
Correction
Source
Cite
Save
Machine Reading By IdeaReader
0
References
0
Citations
NaN
KQI
[]