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Particle Removal Technology for Semiconductor Chips by Using the Hydrogenated Ultrapure Water and Wiping Process
Particle Removal Technology for Semiconductor Chips by Using the Hydrogenated Ultrapure Water and Wiping Process
2021
Jin Li
Hiroshi Kikuchi
Norimasa Nagata
Junichi Ida
Yoichi Miyazaki
Keywords:
Semiconductor
process
Chemical engineering
Particle
Ultrapure water
Materials science
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