Cross-sectional film characterization of exposure-induced carbon contamination on patterned EUV masks

Yu-Jen Fan,Leonid Yankulin,Alin Antohe,Petros Thomas,Rashi Garg,Chimaobi Mbanaso,Yashdeep Khopkar,Thomas Murray,Andrea Wüest,Frank Goodwin,Patrick Naulleau,Kenneth A. Goldberg,Iacopo Mochi,Eric M. Gullikson,Erik H. Anderson,Farhad Salmassi,Gregory Denbeaux

Cross-sectional film characterization of exposure-induced carbon contamination on patterned EUV masks

2010

Yu-Jen Fan
Leonid Yankulin
Alin Antohe
Petros Thomas
Rashi Garg
Chimaobi Mbanaso
Yashdeep Khopkar
Thomas Murray
Andrea Wüest
Frank Goodwin
Patrick Naulleau
Kenneth A. Goldberg
Iacopo Mochi
Eric M. Gullikson
Erik H. Anderson
Farhad Salmassi
Gregory Denbeaux

Author(s): Fan, Yu-Jen; Yankulin, Leonid; Antohe, Alin; Thomas, Petros; Garg, Rashi; Mbanaso, Chimaobi; Khopkar, Yashdeep; Murray, Thomas; Wuest, Andrea; Goodwin, Frank; Naulleau, Patrick; Goldberg, Kenneth A.; Mochi, Iacopo; Gullikson, Eric; Anderson, Erik; Salmassi, Farhad; Denbeaux, Gregory

Keywords:

Carbon
Contamination
Analytical chemistry
Materials science
Extreme ultraviolet lithography
Art history
carbon contamination
Art

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