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Two Layer cmp-process for improving the surface roughness of a magnetic stack in MRAM technology
Two Layer cmp-process for improving the surface roughness of a magnetic stack in MRAM technology
2003
Greg Costrini
P. John Millbrook Hummel
Mahadevaiyer Krishnan
Kia-Seng Low
Keywords:
Surface roughness
Optoelectronics
Magnetoresistive random-access memory
Materials science
two layer
Correction
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