Deposition method for the preparation of compounds

The present invention is a vapor deposition method for the preparation of a compound, comprising supplying each component element of the compound as a vapor, and co-depositing the vapor of the component element on a common substrate, comprising at least one component Elemental vapor is supplied using a cracking source; at least one other component element vapor is supplied using a plasma source; at least one further component element vapor is supplied; To produce a compound.