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Molecular dynamics study on fluorine radical multilayer adsorption during Si, SiO2 or Si3N4 etching processes
Molecular dynamics study on fluorine radical multilayer adsorption during Si, SiO2 or Si3N4 etching processes
2015
Numazawa Satoshi
Machida Ken
Isobe Michiro
Hamaguchi Satoshi
Keywords:
Chemical substance
Nanotechnology
Adsorption
Chemical physics
Etching
Molecular dynamics
Fluorine
Engineering
Science, technology and society
Chemical engineering
Materials science
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